Characterization of Sputtered NiTi Shape Memory Alloy Thin Films

Authors

1 Department of Materials Science and Engineering,Sharif University of Technology

2 Department of Materials Science and Engineering,Tarbiat Modares University

Abstract

Abstract. During recent years, many investigations have been carried out to determine how to select
di erent materials for the making of Micro Electro Mechanical Systems (MEMS) and bio-MEMS. The
NiTi shape memory alloy thin lm has been much regarded as a promising candidate for MEMS due to
its unique shape memory e ect and high energy output. In this research, NiTi thin lm was fabricated
using a sputtering technique from separate elemental Ni and Ti targets. The characterizations of the
deposited lms were investigated using di erent analysis techniques, such as Field Emission SEM, DSC,
XRD, electrical resistivity measurement and nanoindentation.

Keywords


Volume 16, Issue 3 - Serial Number 3
Transactions on Mechanical Engineering (B)
June 2009
  • Receive Date: 01 August 2009
  • Revise Date: 21 December 2024
  • Accept Date: 01 August 2009