Department of Materials Science and Engineering,Tarbiat Modares University
Department of Electrical Engineering,Tarbiat Modares University
Department of Materials Science and Engineering,Shahed University
SiO2 substrates, and then annealed at 400C. Deposition was performed in a Ar + O2+N2 gas
mixture of 1.0 Pa, and oxygen and nitrogen with constant pressures of 0.2 Pa and 0.1 Pa, respectively.
The thicknesses of deposited layers, TiO(2????x)Nx/TiO2/ZnO, were approximately 200 nm, 800 nm and
80 nm, respectively. ZnO was used as a buer layer. The structure and morphology of the deposited lms
were evaluated by X-Ray Diraction (XRD) and scanning electron microscopy (SEM). The average grain
sizes of TiO2 and nitrogen doped annealed thin lms were 25 and 18 nm, respectively. The microstructure
of the annealed lms was anatase. The optical transmittance of the lms was measured using ultravioletvisible
light (UV-vis) spectrophotometer. The photocatalytic activity of the samples was evaluated by the
degradation of Methylene Blue (MB) dye.