TY - JOUR ID - 4429 TI - The effects of thickness on magnetic properties of FeCuNbSiB sputtered thin films JO - Scientia Iranica JA - SCI LA - en SN - 1026-3098 AU - Asghari Shivaee, Hossein AU - Celegato, Federica AU - Tiberto, Paola AU - Castellero, Alberto AU - Baricco, Marcello AU - Madaah Hosseini, Hamid Reza AD - Institute for Nanoscience and Nanotechnology, Sharif University of Technology, 113658639 Tehran, Iran AD - Istituto Nazionale di Ricerca Metrologica (INRIM), I-10135 Torino, Italy AD - Department of Chemistry and NIS, University of Turin, I-10125 Torino, Italy AD - Department of Materials Science and Engineering, Sharif University of Technology, 1458889694 Tehran, Iran Y1 - 2017 PY - 2017 VL - 24 IS - 6 SP - 3521 EP - 3525 KW - Magnetic properties KW - Thin films KW - Ion sputtering KW - Residual stresses KW - Nanoindentation DO - 10.24200/sci.2017.4429 N2 - Thin films of Fe73.1Cu1Nb3.1Si14.7B8.2 alloy having thickness of 200, 500 and 800 nm have been deposited by RF sputtering. Their magnetic properties have been characterized using alternating gradient field magnetometer (AGFM) and vibrating sample magnetometer (VSM). The effects of residual stresses investigated by nanoindentation experiments were conducted on as-deposited samples. It is observed that the coercivity of as-deposited films is inversely proportional to the thickness in relation with the residual stress induced during sputtering. UR - https://scientiairanica.sharif.edu/article_4429.html L1 - https://scientiairanica.sharif.edu/article_4429_9785cbd2c4b66d39d7422d6be8cfa235.pdf ER -